Applied Physics A

, Volume 79, Issue 4, pp 743–745

Exploring microstencils for sub-micron patterning using pulsed laser deposition

  • F. Vroegindeweij
  • E.A. Speets
  • J.A.J. Steen
  • J. Brugger
  • D.H.A. Blank
Article

DOI: 10.1007/s00339-004-2749-0

Cite this article as:
Vroegindeweij, F., Speets, E., Steen, J. et al. Appl. Phys. A (2004) 79: 743. doi:10.1007/s00339-004-2749-0

Abstract

The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 μm down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

Copyright information

© Springer-Verlag 2004

Authors and Affiliations

  • F. Vroegindeweij
    • 1
  • E.A. Speets
    • 1
  • J.A.J. Steen
    • 2
  • J. Brugger
    • 2
  • D.H.A. Blank
    • 1
  1. 1.Faculty of Science & TechnologyUniversity of Twente and MESA+ Institute for NanotechnologyEnschedeThe Netherlands
  2. 2.Microsystems LaboratoryEcole Polytechnique Fédérale de Lausanne (EPFL)LausanneSwitzerland

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