Applied Physics A

, Volume 79, Issue 7, pp 1687–1694

Picosecond pulsed laser deposition at high vibrational excitation density: the case of poly(tetrafluoroethylene)

Article

DOI: 10.1007/s00339-004-2681-3

Cite this article as:
Papantonakis, M. & Haglund Jr., R. Appl Phys A (2004) 79: 1687. doi:10.1007/s00339-004-2681-3

Abstract

The availability of tunable, picosecond free-electron lasers operating with high efficiency in the mid-infrared opens a materials-processing regime qualitatively distinct from that accessed by femtosecond Ti:sapphire lasers, one which is characterized by a high spatio-temporal density of vibrational, rather than electronic, excitation. As an example of this novel materials-processing regime, we present new results on pulsed laser deposition of thin poly(tetrafluoroethylene) films. Films of poly(tetrafluoroethylene) were deposited by resonant (4.2 and 8.26 μm) and non-resonant (7.1 μm) infrared picosecond laser ablation from either a pressed powder target or a commercial bulk target. The films were smooth and crystalline and largely free of particulates without annealing. Infrared and X-ray photoelectron spectra indicated that the films retained the chemical properties of the starting material. Observations of the film properties are consistent with a steady-state ablation mechanism, possibly enhanced by non-linear absorption due to the high photon flux in the free-electron laser micropulses.

Copyright information

© Springer-Verlag 2004

Authors and Affiliations

  1. 1.Department of Physics and Astronomy and W.M. Keck Foundation Free-Electron Laser CenterVanderbilt UniversityNashvilleUSA