Applied Physics A

, Volume 76, Issue 3, pp 355–357

Efficient submicron processing of metals with femtosecond UV pulses

Authors

  • J. Békési
    • Laser Laboratorium Göttingen e.V., Hans-Adolf-Krebs Weg 1, 37 077 Göttingen, Germany
  • J.-H. Klein-Wiele
    • Laser Laboratorium Göttingen e.V., Hans-Adolf-Krebs Weg 1, 37 077 Göttingen, Germany
  • P. Simon
    • Laser Laboratorium Göttingen e.V., Hans-Adolf-Krebs Weg 1, 37 077 Göttingen, Germany

DOI: 10.1007/s00339-002-1820-y

Cite this article as:
Békési, J., Klein-Wiele, J. & Simon, P. Appl Phys A (2003) 76: 355. doi:10.1007/s00339-002-1820-y

Abstract.

The generation of submicron-sized holes on metal surfaces by applying femtosecond UV laser pulses was investigated. Different optical schemes based on a Schwarzschild-type reflective objective were used to reach optimized ablation quality and efficiency in different applications (hole ablation, through-hole drilling, generation of surface patterns consisting of holes, etc.). Submicron-sized holes and hole patterns were ablated onto metal surfaces and drilled through ∼5-μm-thick steel foils with 600-nm diameter on the output side. Using a special optical interferometric method, large-area surface processing of high-conductivity materials in the submicron regime was performed. Combining these techniques with the application of high-repetition-rate ultra-short UV laser sources, large-area sub-μm processing of all kinds of materials in industrial environments is possible.

PACS: 06.60.J; 61.80.B; 79.20D; 81.05B; 81.40

Copyright information

© Springer-Verlag 2002