An integrated planning approach for a nanodeposition manufacturing process

ORIGINAL ARTICLE

DOI: 10.1007/s00170-010-2651-1

Cite this article as:
Tang, D. & Palekar, U.S. Int J Adv Manuf Technol (2010) 51: 561. doi:10.1007/s00170-010-2651-1
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Abstract

This paper deals with the planning problem in a nanodeposition manufacturing process, in which a toolbit that consists of a multilayer grid of micro/nanofluidic channels is used to deposit nanoscale liquid materials to desired positions on workparts to form solid patterns. The objective is to obtain a planning procedure that achieves efficient throughput for the studied nanodeposition manufacturing systems. We break down the studied problem into several sub-problems as design pattern decomposition, nanopore assignment, liquid material routing in the multilayer grid fluidic network, and toolbit path planning. Efficient algorithms are proposed to solve these sub-problems individually, and then finally integrated into a framework that systematically plans the nanodeposition manufacturing process. A software tool that plans, simulates, and controls the nanodeposition manufacturing process by implementing the proposed algorithms is reported in this paper.

Keywords

Process planning Nanodeposition manufacturing systems Pattern decomposition Fluidic routing Toolbit path planning 

Copyright information

© Springer-Verlag London Limited 2010

Authors and Affiliations

  1. 1.Intel CorporationChandlerUSA
  2. 2.University of Illinois at Urbana-ChampaignChampaignUSA
  3. 3.2130 East Saltsage DrivePhoenixUSA

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