Capillary instabilities in thin films
Rent the article at a discountRent now
* Final gross prices may vary according to local VAT.Get Access
Very thin films, less than 100 nm-thick, are used in a variety of applications, including as catalysts and for thin film reactions to form patterned silicides in electronic devices. Because of their high surface to volume ratio, these very thin films are subject to cap-illary instability and can agglomerate well below their melting temperatures. In order to develop a general understanding of agglomeration in very thin films, we have studied initially continuous and patterned films of gold on fused silica substrates. Two in situ techniques were used to monitor agglomeration: 1) heating and video recording in a transmission electron microscope, and 2) measurement of the intensity of laser light transmitted through a sample heated in a furnace. Electron microscopy allowed inves-tigation of the role of the microstructure of the Au film and analysis of light transmis-sion during heating allowed determination of temperature-dependent and film-thick-ness-dependent agglomeration rates. These results will be described along with models for the agglomeration process.
- LordRayleigh, Proc. London Math. Soc.10, 4 (1878). CrossRef
- W. Mullins, J. Appl. Phys.30, 77 (1959). CrossRef
- W. Mullins, J. Appl. Phys.28, 333 (1957). CrossRef
- D. J. Srolovitz and S. A. Safran, J. Appl. Phys.60, 247 (1986). CrossRef
- K. T. Miller, F. F. Lange and D. B. Marshall, J. Mater. Res.5, 151 (1990).
- D. J. Srolovitz and S. A. Safran, J. Appl. Phys.60, 255 (1986). CrossRef
- R. H. Brandon and F. J. Bradshaw, R.A.E. (Franborough) Rep. 66095 (1966).
- C. M. Kennefick and R. Raj, Acta Metall.37, 2947 (1989). CrossRef
- J. W. Mayer and S. S. Lau, Electronic Materials Science, Macmillan Publishing Co., New York, 1990.
- E. Jiran, Ph.D. Thesis, Dept. of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA (1990).
- N A. Gjostein, Trans. Met. Soc. AIME239 (1967) 785.
- A. J. Melmed and R. Gomez, J. Chem. Phys.34 (1961) 1802. CrossRef
- M. Dreschsler, J. J. Metois and J. C. Heyraud, Surf. Sci.108, 549 (1981). CrossRef
- Capillary instabilities in thin films
Journal of Electronic Materials
Volume 19, Issue 11 , pp 1153-1160
- Cover Date
- Print ISSN
- Online ISSN
- Additional Links
- Au thin films
- capillary instabilities
- Industry Sectors