Journal of Electronic Materials

, Volume 30, Issue 6, pp 733–737

Antireflective structures in CdTe and CdZnTe surfaces by ECR plasma etching

Authors

  • A. J. Stoltz
    • E-OIR Measurements, Inc.
  • M. R. Banish
    • SY Technology, Inc.
  • J. H. Dinan
    • Night Vision and Electronic Sensors Directorate
  • J. D. Benson
    • Night Vision and Electronic Sensors Directorate
  • D. R. Brown
    • MEMS Optical LLC
  • D. B. Chenault
    • SY Technology, Inc.
  • P. R. Boyd
    • Army Research Laboratory
Special Issue Paper

DOI: 10.1007/BF02665864

Cite this article as:
Stoltz, A.J., Banish, M.R., Dinan, J.H. et al. JEM (2001) 30: 733. doi:10.1007/BF02665864

Abstract

A rigorous coupled-wave analysis procedure has been used to design structures which can be embedded in Cd(Zn)Te surfaces to make them antireflective in the 8–14 m spectral region. Gray scale lithography was used to produce these patterns in photoresist layers. High fidelity transfer of patterns into Cd(Zn)Te surfaces was accomplished by utilizing an electron cyclotron resonance plasma with etch selectivity values in the range of 6.7–13.3. Transmission values at patterned surfaces were measured to be as high as 99.3%.

Key words

CdZnTeantireflectiveECR plasma etching

Copyright information

© TMS-The Minerals, Metals and Materials Society 2001