Antireflective structures in CdTe and CdZnTe surfaces by ECR plasma etching
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A rigorous coupled-wave analysis procedure has been used to design structures which can be embedded in Cd(Zn)Te surfaces to make them antireflective in the 8–14 m spectral region. Gray scale lithography was used to produce these patterns in photoresist layers. High fidelity transfer of patterns into Cd(Zn)Te surfaces was accomplished by utilizing an electron cyclotron resonance plasma with etch selectivity values in the range of 6.7–13.3. Transmission values at patterned surfaces were measured to be as high as 99.3%.
- T.K. Gaylord, W.E. Baird, and M.G. Moharam,Appl. Opt. 25, 4562 (1986).
- R. Enger and S.K. Case,Appl. Opt. 22, 3220 (1983).
- D.H. Raguin and G.M. Morris,Appl. Opt. 32, 1154 (1993).
- R.E. Smith, M.E. Warren, J. Wendt, and G. Vawter,Opt. Lett. 21, 1201 (1996). CrossRef
- E.B. Grann, M.G. Moharam, and D.A. Pommet,JOSAA 11, 2695 (1994).
- H. Dammann,Appl. Opt. 17, 2273 (1978).
- GSOLVER software (Grating Solver Development Company, P.O. Box 353, Allen, TEXAS 75013).
- J.D. Benson, J. Johnson, L. Almeida, M. Martinka, J.M. Turner, J.Y. Johnson, P. Boyd, D. Advena, and J.H. Dinan,Control of the Aspect Ratio in Dry Etched II–VI Compounds (Toledo, OH: Int. REST Investigators Soc., 1998).
- R.C. Keller, H. Zimmerman, M. Seelmann-Eggebert, and H.J. Richter,J. Electron. Mater. 25, 534 (1997).
- E.R. Schulte, C.A. Cockrum, and F.I. Gesswein,Proc. 1993 IRIS Infrared Mater. Specialty Group (Toledo, OH: Int. REST Investigators Soc., 1993).
- N.K. Dhar, P.R. Boyd, M. Martinka, J.H. Dinan, L.A. Almeida, and N. Goldsman,J. Electron. Mater. 29, 748 (2000) CrossRef
- Antireflective structures in CdTe and CdZnTe surfaces by ECR plasma etching
Journal of Electronic Materials
Volume 30, Issue 6 , pp 733-737
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- Author Affiliations
- 1. E-OIR Measurements, Inc., Spotsylvania, VA
- 2. SY Technology, Inc., Huntsville, AL
- 3. Night Vision and Electronic Sensors Directorate, Ft. Belvoir, VA
- 4. MEMS Optical LLC, Huntsville, AL
- 5. Army Research Laboratory, Adelphi, MD