Journal of Electronic Materials

, Volume 24, Issue 5, pp 697–705

A comparison of techniques for nondestructive composition measurements in CdZnTe substrates

  • S. P. Tobin
  • J. P. Tower
  • P. W. Norton
  • D. Chandler-Horowitz
  • P. M. Amirtharaj
  • V. C. Lopes
  • W. M. Duncan
  • A. J. Syllaios
  • C. K. Ard
  • N. C. Giles
  • Jaesun Lee
  • R. Balasubramanian
  • A. B. Bollong
  • T. W. Steiner
  • M. L. W. Thewalt
  • D. K. Bowen
  • B. K. Tanner
Article

DOI: 10.1007/BF02657981

Cite this article as:
Tobin, S.P., Tower, J.P., Norton, P.W. et al. JEM (1995) 24: 697. doi:10.1007/BF02657981

Abstract

We report an overview and a comparison of nondestructive optical techniques for determining alloy composition x in Cd1-xZnxTe substrates for HgCdTe epitaxy. The methods for single-point measurements include a new x-ray diffraction technique for precision lattice parameter measurements using a standard highresolution diffractometer, room-temperature photoreflectance, and low-temperature photoluminescence. We compare measurements on the same set of samples by all three techniques. Comparisons of precision and accuracy, with a discussion of the strengths and weaknesses of different techniques, are presented. In addition, a new photoluminescence excitation technique for full-wafer imaging of composition variations is described.

Key words:

CdZnTeHgCdTelattice constantnondestructive measurementsphotoluminescencephotoreflectance

Copyright information

© The Metallurgical of Society of AIME 1995

Authors and Affiliations

  • S. P. Tobin
    • 1
  • J. P. Tower
    • 1
  • P. W. Norton
    • 1
  • D. Chandler-Horowitz
    • 2
  • P. M. Amirtharaj
    • 2
  • V. C. Lopes
    • 3
  • W. M. Duncan
    • 3
  • A. J. Syllaios
    • 3
  • C. K. Ard
    • 4
  • N. C. Giles
    • 5
  • Jaesun Lee
    • 5
  • R. Balasubramanian
    • 6
  • A. B. Bollong
    • 6
  • T. W. Steiner
    • 7
  • M. L. W. Thewalt
    • 7
  • D. K. Bowen
    • 8
  • B. K. Tanner
    • 9
  1. 1.Loral Infrared & Imaging SystemsLexington
  2. 2.National Institute of Standards and TechnologyGaithersburg
  3. 3.Texas InstrumentsDallas
  4. 4.II-VI, Inc.Saxonburg
  5. 5.West Virginia UniversityMorgantown
  6. 6.Johnson Matthey ElectronicsSpokane
  7. 7.Simon Fraser UniversityBurnabyCanada
  8. 8.University of WarwickCoventryUK
  9. 9.University of DurhamDurhamUK