Current Genetics

, Volume 25, Issue 5, pp 407–411

Isolation and characterization of three mutants with increased sensitivity to photoactivated 3-carbethoxypsoralen in Saccharomyces cerevisiae

Authors

  • C. B. Querol
    • Departamento de Biofisica, Centro de BiotecnologiaUFRGS
  • S. O. Paesi-Toresan
    • Departamento de Biofisica, Centro de BiotecnologiaUFRGS
  • L. B. Meira
    • Departamento de Biofisica, Centro de BiotecnologiaUFRGS
  • M. Brendel
    • Institut für MikrobiologieJ. W. Goethe-Universität
  • J. A. P. Henriques
    • Departamento de Biofisica, Centro de BiotecnologiaUFRGS
Original Articles

DOI: 10.1007/BF00351778

Cite this article as:
Querol, C.B., Paesi-Toresan, S.O., Meira, L.B. et al. Curr Genet (1994) 25: 407. doi:10.1007/BF00351778

Abstract

The complementation and genetical analysis of yeast mutants sensitive to photoactivated 3-carbethoxy-psoralen define three novel recessive mutant alleles pso-5-1, pso6-1, and pso7-1. Their cross-sensitivity to UV254nm, radiomimetic mutagens, and to chemicals enhancing oxidative stress suggest that these mutants are either impaired in metabolic steps protecting from oxidative stress or in mechanisms of the repair of oxygen-dependent DNA lesions. None of the three novel mutant alleles block the induction of reverse mutation by photoactivated mono- and bi-functional psoralens, nitrogen mustards, or UV254nm.

Key words

Psoralen sensitivitySaccharomyces cerevisiaeDNA repairOxidative stress
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Copyright information

© Springer-Verlag 1994