Abstract
The TiB2 thin films were deposited on steel substrates using RF magnetron sputtering technique with the low normalized substrate temperature (0.1<T s/T m<0.2). Microstructure of these films was obtained by field emission scanning electron microscope (FESEM) and the grazing incidence X-ray diffraction (GIXRD) characterization, while the composition of films was obtained using Auger emission spectroscopy (AES) analysis. It was found that the TiB2 thin films were overstoichiometric with the B/Ti ratio at 2.33 and the diffusion of Ti and B atoms on the substrate surface was greatly improved at 350 °C. Moreover, a new dense structure, named “equiaxed” grain structure was observed by FESEM at this substrate temperature. Combined with FESEM and AES analysis, it was suggested that the “equiaxed” grain structure was located in Zone 2 at the normalized substrate temperature as low as 0.18.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
F Kunc, J Musil, P H Mayrhofer, et al. Low-stress Superhard Ti-B Films Prepared by Magnetron Sputtering[J]. Surf. Coat. Technol., 2003, 174/175:744–753
J Musil. Hard and Superhard Nanocomposite Coatings[J]. Surf. Coat. Technol., 2000, 125(1–3):322–330
J A Thornton. Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings[J]. J. Vac. Sci. Technol., 1974, 11(4):666–670
D Galvan, Y T Pei, J Th M De Hosson. Deformation and Failure Mechanism of Nano-composite Coatings under Nano-indentation[J]. Surf. Coat. Technol., 2006, 200(24): 6 718–6 726
K S Sree Harsha. Principles of Vapor Deposition of Thin Films: Nucleation and Growth of Films[M]. Oxford: Elsevier, 2005:795–802
N Panich, Y Sun. Effect of Substrate Rotation on Structure, Hardness and Adhesion of Magnetron Sputtered TiB2 Coating on High Speed Steel[J]. Thin Solid Films, 2006, 500(1–2):190–196
N Panich, P Wangyao, S Hannongbua, et al. Tribological Study of Nano-multilayered Ultra-hard Coatings Based on TiB2[J]. Rev. Adv. Mater. Sci., 2006 13(2):117–124
H Savaloni, H Kangarloo. Influence of Film Thickness, Substrate Temperature and Nano-structural Changes on the Optical Properties of UHV Deposited Ti Thin Films[J]. J. Phys. D: Appl. Phys., 2007, 40(1):203–214
S C Tjong, H Chen. Nanocrystalline Materials and Coatings[J]. Mater. Sci. Eng. R, 2004, 45(1–2):1–88
Z Zhang, M G Lagally. Atomistic Processes in the Early Stages of Thin-film Growth[J]. Science, 1997, 276(5 311):377–383
C V Thompson. Structure Evolution During Processing of Polycrystalline Films[J]. Annu. Rev. Mater. Sci., 2000, 30(1): 159–190
K H Muller. Dependence of Thin-film Microstructure on Deposition Rate by Means of a Computer Simulation[J]. J. Appl. Phys., 1985, 58(7):2 573–2 576
P H Mayrhofer, C Mitterer. Self-Organized Nanocolumnar Structure in Superhard TiB2 Thin Films[J]. Appl. Phys. Lett., 2005, 86(13):131 909–131 912
P H Mayrhofer, C Mitterer, J Musil. Structure-property Relationships in Single-and Dual-phase Nanocrystalline Hard Coatings[J]. Surf. Coat. Technol., 2003, 174/175:725–731
Author information
Authors and Affiliations
Corresponding author
Additional information
Funded by the Scientific Research-special Funds of Dongguan City in Guangdong Province (No. 2003D1011)
Rights and permissions
About this article
Cite this article
Dai, W., Zhang, T., Yang, J. et al. Structure and properties of TiB2 thin films deposited at low temperatures using RF magnetron sputtering. J. Wuhan Univ. Technol.-Mat. Sci. Edit. 23, 666–669 (2008). https://doi.org/10.1007/s11595-007-5666-1
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11595-007-5666-1