Abstract
A general approach to fabricate nanoparticle arrays of different kinds of materials is demonstrated in this paper. It was found that the center-to-center distance of the nanoparticles or the nanoclusters can be controlled using patterned block copolymer nanoreactors by adding polystyrene (PS) homopolymer to poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) diblock copolymer thin film. The number of the nanoparticles formed in the P4VP nanodomains can also be adjusted by addition of polystyrene (PS) homopolymer to poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) diblock copolymer. In fabrication of Au nanoparticle arrays, HAuCl4 precursor was directly loaded into P4VP nanodomains of the diblock copolymer thin film by using a methanol solvent, which is a good solvent for P4VP but non-solvent for PS. The Au nanoparticle arrays were then obtained by reducing HAuCl4 with sodium citrate dihydrate, and then in situ transferred to silicon substrate by a two-step calcination method. ZnO and Fe x O y nanoparticle arrays were also synthesized by this approach with thermal decomposition and double decomposition reactions, respectively. Additionally, the advantage of using two-step calcination method over the air plasma method was discussed.
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Acknowledgments
The authors gratefully acknowledge the China Scholarship Council (CSC) for the fellowship to support Xihong Zu as a visiting student at Georgia Institute of Technology. Thanks to Xiaobo Hu for assisting with the air plasma method, and thanks to Dr. Zhengzhi Zhou and Dr. Ying Wang for general help.
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Zu, X., Tu, W. & Deng, Y. General approach for fabricating nanoparticle arrays via patterned block copolymer nanoreactors. J Nanopart Res 13, 1–13 (2011). https://doi.org/10.1007/s11051-010-0059-3
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DOI: https://doi.org/10.1007/s11051-010-0059-3