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Photocatalysis of Ag Doped TiO x Films Prepared at Room Temperature

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Abstract

The aim of this paper is an investigation of the photocatalytic efficiency of TiO x thin films deposited by DC reactive magnetron sputtering at low temperature and doped by Ag noble metal. Crystallographic structure and chemical composition of as-deposited films were examined by XRD and RBS, respectively. Ag/TiO x films morphology was studied by SEM analysis. The photocatalytic activity was evaluated from the decomposition speed of an aqueous solution of the Acid Orange 7, exposed to UV/VIS light. A systematic change of Ag concentration in TiO x films led to a maximum activity. Such a maximum is discussed taking into account composition, morphology and structure of the films.

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Acknowledgments

This work was supported by MSMT, project NANOPIN 1M0577 and by GA AV CR, project no. KAN101120701.

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Authors and Affiliations

  1. Department of Material Science, Faculty of Mechanical Engineering, Technical University in Liberec, Studentska 2, 46117, Liberec, Czech Republic

    Marta Horakova, Eric Aubry & Petr Spatenka

  2. Département MN2S, Institut FEMTO-ST (UMR 6174 CNRS), UFC, ENSMM, UTBM, 26 Chemin de l’Épitaphe, 25030, Besançon Cedex, France

    Nicolas Martin & Eric Aubry

  3. Department of Physics, University of South Bohemia, Jeronymova 10, 370 01, Ceske Budejovice, Czech Republic

    Petr Spatenka

Authors
  1. Marta Horakova
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  2. Nicolas Martin
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  3. Eric Aubry
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  4. Petr Spatenka
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Correspondence to Marta Horakova.

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Horakova, M., Martin, N., Aubry, E. et al. Photocatalysis of Ag Doped TiO x Films Prepared at Room Temperature. Catal Lett 132, 244–247 (2009). https://doi.org/10.1007/s10562-009-0093-x

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  • DOI: https://doi.org/10.1007/s10562-009-0093-x

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