Abstract
X-ray imaging is used in many applications such as medical diagnosis and non-destructive inspection, and has become an essential technologies in these areas. In one image technique, X-ray phase information is obtained using X-ray Talbot interferometer, for which X-ray diffraction gratings are required; however, the manufacture of fine, highly accurate, and high aspect ratio gratings is very difficult. X-ray lithography could be used to fabricate structures with high precision since it uses highly directive syncrotron radiation. Therefore, we decided to fabricate X-ray gratings using X-ray lithography technique. The accuracy of the fabricated structure depends largely on the accuracy of the X-ray mask used. In our research, we combined deep silicon dry etching technology with ultraviolet lithography in order to fabricate untapered and high precision X-ray masks containing rectangular patterns. We succeeded in fabricating an X-ray mask with a pitch of 5.3 μm. The thickness of the Au absorber was about 5 μm, and the effective area was 60 × 60 mm2, which is a sufficient size for phase tomography imaging. We demonstrated the utility of the Si dry etching process for making high precision X-ray masks.
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References
David C, Nöhammer B, Solak HH, Ziegler E (2002) Appl Phys Lett 81:3287–3289
Matsumoto M, Takiguchi K, Tanaka M, Funabiki Y, Takeda H, Momose A, Utsumi Y, Hattori T (2007) Microsyst Technol 13:543–546
Momose A (2005) Jpn J Appl Phys 44:6355–6367
Momose A, Kawamoto S, Koyama I, Hamaishi Y, Takai K, Suzuki Y (2003) Jpn J Appl Phys 42:L866–L868
Momose A, Yashiro W, Moritake M, Takeda Y, Uesugi K, Takeuchi A, Suzuki Y, Tanaka M, Hattori T (2006) Proceedings of the Society of Photo-Optical Instrumentation Engineers 6318: 63180T1–63180T10
Noda D, Tanaka M, Shimada K, Hattori T (2007) Jpn J Appl Phys 46:849–851
Noda D, Tanaka M, Shimada K, Yashiro W, Momose A, Hattori T (2008) Microsyst Technol 14:1311–1315
Pfeiffer F, Weitkamp T, Bunk O, David C (2006) Nat Phys 2:258–261
Tsujii H, Shimada K, Tanaka M, Yashiro W, Noda D, Hattori T (2008) J Adv Mech Des Syst Manuf 2:246–251
Utsumi Y, Kishimoto T, Hattori T, Hara H (2007) Microsyst Technol 13:417–423
Acknowledgments
This research was supported by the research project “Development of Systems and Technology for Advanced Measurement and Analysis” from the Japan Science and Technology Agency (JST).
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Noda, D., Tsujii, H., Takahashi, N. et al. Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer. Microsyst Technol 16, 1309–1313 (2010). https://doi.org/10.1007/s00542-010-1085-x
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DOI: https://doi.org/10.1007/s00542-010-1085-x