Skip to main content
Log in

Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer

  • Technical Paper
  • Published:
Microsystem Technologies Aims and scope Submit manuscript

Abstract

X-ray imaging is used in many applications such as medical diagnosis and non-destructive inspection, and has become an essential technologies in these areas. In one image technique, X-ray phase information is obtained using X-ray Talbot interferometer, for which X-ray diffraction gratings are required; however, the manufacture of fine, highly accurate, and high aspect ratio gratings is very difficult. X-ray lithography could be used to fabricate structures with high precision since it uses highly directive syncrotron radiation. Therefore, we decided to fabricate X-ray gratings using X-ray lithography technique. The accuracy of the fabricated structure depends largely on the accuracy of the X-ray mask used. In our research, we combined deep silicon dry etching technology with ultraviolet lithography in order to fabricate untapered and high precision X-ray masks containing rectangular patterns. We succeeded in fabricating an X-ray mask with a pitch of 5.3 μm. The thickness of the Au absorber was about 5 μm, and the effective area was 60  × 60 mm2, which is a sufficient size for phase tomography imaging. We demonstrated the utility of the Si dry etching process for making high precision X-ray masks.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8
Fig. 9
Fig. 10

Similar content being viewed by others

References

  • David C, Nöhammer B, Solak HH, Ziegler E (2002) Appl Phys Lett 81:3287–3289

    Article  Google Scholar 

  • Matsumoto M, Takiguchi K, Tanaka M, Funabiki Y, Takeda H, Momose A, Utsumi Y, Hattori T (2007) Microsyst Technol 13:543–546

    Article  Google Scholar 

  • Momose A (2005) Jpn J Appl Phys 44:6355–6367

    Article  Google Scholar 

  • Momose A, Kawamoto S, Koyama I, Hamaishi Y, Takai K, Suzuki Y (2003) Jpn J Appl Phys 42:L866–L868

    Article  Google Scholar 

  • Momose A, Yashiro W, Moritake M, Takeda Y, Uesugi K, Takeuchi A, Suzuki Y, Tanaka M, Hattori T (2006) Proceedings of the Society of Photo-Optical Instrumentation Engineers 6318: 63180T1–63180T10

  • Noda D, Tanaka M, Shimada K, Hattori T (2007) Jpn J Appl Phys 46:849–851

    Article  Google Scholar 

  • Noda D, Tanaka M, Shimada K, Yashiro W, Momose A, Hattori T (2008) Microsyst Technol 14:1311–1315

    Article  Google Scholar 

  • Pfeiffer F, Weitkamp T, Bunk O, David C (2006) Nat Phys 2:258–261

    Article  Google Scholar 

  • Tsujii H, Shimada K, Tanaka M, Yashiro W, Noda D, Hattori T (2008) J Adv Mech Des Syst Manuf 2:246–251

    Article  Google Scholar 

  • Utsumi Y, Kishimoto T, Hattori T, Hara H (2007) Microsyst Technol 13:417–423

    Article  Google Scholar 

Download references

Acknowledgments

This research was supported by the research project “Development of Systems and Technology for Advanced Measurement and Analysis” from the Japan Science and Technology Agency (JST).

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Daiji Noda.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Noda, D., Tsujii, H., Takahashi, N. et al. Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer. Microsyst Technol 16, 1309–1313 (2010). https://doi.org/10.1007/s00542-010-1085-x

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00542-010-1085-x

Keywords

Navigation