Ablated gratings on borosilicate glass by 193-nm excimer laser radiation

Abstract.

Relief gratings of 500-nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation through the use of an excimer laser, at a wavelength of 193-nm, and a modified Mach–Zehnder interferometer. The grating fabrication process has been quantified by the use of diffraction efficiency measurements and atomic force microscope microscans and is related to the incident energy density.