Abstract
This paper deals with the planning problem in a nanodeposition manufacturing process, in which a toolbit that consists of a multilayer grid of micro/nanofluidic channels is used to deposit nanoscale liquid materials to desired positions on workparts to form solid patterns. The objective is to obtain a planning procedure that achieves efficient throughput for the studied nanodeposition manufacturing systems. We break down the studied problem into several sub-problems as design pattern decomposition, nanopore assignment, liquid material routing in the multilayer grid fluidic network, and toolbit path planning. Efficient algorithms are proposed to solve these sub-problems individually, and then finally integrated into a framework that systematically plans the nanodeposition manufacturing process. A software tool that plans, simulates, and controls the nanodeposition manufacturing process by implementing the proposed algorithms is reported in this paper.
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Tang, D., Palekar, U.S. An integrated planning approach for a nanodeposition manufacturing process. Int J Adv Manuf Technol 51, 561–573 (2010). https://doi.org/10.1007/s00170-010-2651-1
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DOI: https://doi.org/10.1007/s00170-010-2651-1