Multiscale Modeling in Epitaxial Growth

Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.

• Finite
• differential equation
• epitaxial growth
• equation
• finite element method
• multiscale analysis
• numerical analysis
• numerical methods
• partial differential equations

• Crystal Growth group, research center caesar, Bonn, Germany

  Axel Voigt

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