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Effect of local curvature of internal and external interfaces on mass transfer responsible for thin film degradation

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Abstract

The degradation of thin films on thermal annealing was studied by atomic force and scanning electron microscopy. Main factors that govern high-temperature mass transfer in the multilayer structures were disclosed. It is shown that local curvature of internal and external interfaces is a driving force in the mass transfer responsible for thin film degradation, redistribution of alloying elements, and formation of silicides.

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Authors and Affiliations

  1. Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences, Tomsk, 634021, Russia

    A. V. Panin & A. R. Shugurov

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  1. A. V. Panin
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  2. A. R. Shugurov
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Correspondence to A. V. Panin.

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Original Russian Text © A.V. Panin, A.R. Shugurov, 2013, published in Fizicheskaya Mezomekhanika, 2013, Vol. 16, No. 3, pp. 95–101.

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Panin, A.V., Shugurov, A.R. Effect of local curvature of internal and external interfaces on mass transfer responsible for thin film degradation. Phys Mesomech 16, 348–354 (2013). https://doi.org/10.1134/S1029959913040085

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