Abstract
Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.
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Original Russian Text © S.G. Psakh’e, A.I. Lotkov, S.N. Meisner, L.L. Meisner, V.P. Sergeev, A.R. Sungatulin, 2013, published in Perspektivnye Materialy, 2013, No. 2, pp. 42–49.
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Psakh’e, S.G., Lotkov, A.I., Meisner, S.N. et al. Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide. Inorg. Mater. Appl. Res. 4, 457–463 (2013). https://doi.org/10.1134/S2075113313050134
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DOI: https://doi.org/10.1134/S2075113313050134