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Surface Interactions of Radicals During Plasma Processing of Polymers

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Plasmas and Polymers

Abstract

Surface interactions of radical species were investigated using the imaging of radicals interacting with surfaces (IRIS) technique during plasma surface modification of polymers. Three plasma systems were investigated by spatially probing the laser induced fluorescence of individual radical species and determining their surface scattering coefficients, S. The behavior of CF2 moieties on polymer surfaces was studied using the fluorocarbon plasmas C2F6 and hexafluoropropylene oxide (HFPO). Three types of surface interactions were observed, surface generation of CF2 (S > 1), surface loss of CF2 (S < 1), and unit scattering (S = 1). Surface loss of CF2 was seen in HFPO plasmas, while CF2 was generated in C2F6 systems. The differences between these systems is believed to be the result of different overall surface interactions, specifically film deposition in the HFPO system and etching in the C2F6 system. Using NH3 plasmas, the surface interactions of NH2 radicals with polymers was also investigated. Here, NH2 is generated at the surface of polyethylene and polytetrafluoroethylene substrates, but is consumed on polyimide substrates. Ion effects were also investigated by placing a grounded mesh in the path of the molecular beam to remove charged species.

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Authors and Affiliations

  1. Department of Chemistry, Colorado State University, Fort Collins, Colorado, 80523-1872

    Carmen I. Butoi, Neil M. Mackie, Patrick R. McCurdy, James R. D. Peers & Ellen R. Fisher

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  1. Carmen I. Butoi
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  2. Neil M. Mackie
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  3. Patrick R. McCurdy
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  4. James R. D. Peers
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  5. Ellen R. Fisher
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Correspondence to Ellen R. Fisher.

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Butoi, C.I., Mackie, N.M., McCurdy, P.R. et al. Surface Interactions of Radicals During Plasma Processing of Polymers. Plasmas and Polymers 4, 77–91 (1999). https://doi.org/10.1023/A:1021855632553

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