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Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering

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Acta Metallurgica Sinica (English Letters) Aims and scope

Abstract

The Cr–Si–N coatings were prepared by combining system of high-power impulse magnetron sputtering and pulsed DC magnetron sputtering. The Si content in the coating was adjusted by changing the sputtering power of the Si target. By virtue of electron-probe microanalysis, X-ray diffraction analysis and scanning electron microscopy, the influence of the Si content on the coating composition, phase constituents, deposition rate, surface morphology and microstructure was investigated systematically. In addition, the change rules of micro-hardness, internal stress, adhesion, friction coefficient and wear rate with increasing Si content were also obtained. In this work, the precipitation of silicon in the coating was found. With increasing Si content, the coating microstructure gradually evolved from continuous columnar to discontinuous columnar and quasi-equiaxed crystals; accordingly, the coating inner stress first declined sharply and then kept almost constant. Both the coating hardness and the friction coefficient have the same change tendency with the increase of the Si content, namely increasing at first and then decreasing. The Cr–Si–N coating presented the highest hardness and average friction coefficient for an Si content of about 9.7 at.%, but the wear resistance decreased slightly due to the high brittleness. The above phenomenon was attributed to a microstructural evolution of the Cr–Si–N coatings induced by the silicon addition.

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Acknowledgements

This work was supported by the Global Frontier Program through the Global Frontier Hybrid Interface Materials (GFHIM) of the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning (No. 2013M3A6B1078874). In addition, it was also funded by the National Nature Science Foundation of China (No. 51301181), the Tianjin Key Research Program of Application Foundation and Advanced Technology (No. 15JCZDJC39700), the Tianjin Science and Technology correspondent project (No. 16JCTPJC49500), and the Innovation Team Training Plan of Tianjin Universities and colleges (No. TD12-5043).

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Authors and Affiliations

  1. Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin, 300222, China

    Tie-Gang Wang, Yu Dong, Belachew Abera Gebrekidan, Yan-Mei Liu & Qi-Xiang Fan

  2. Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan, 609-735, South Korea

    Tie-Gang Wang & Kwang Ho Kim

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  1. Tie-Gang Wang
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  2. Yu Dong
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  3. Belachew Abera Gebrekidan
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  4. Yan-Mei Liu
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  5. Qi-Xiang Fan
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  6. Kwang Ho Kim
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Correspondence to Tie-Gang Wang or Kwang Ho Kim.

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Wang, TG., Dong, Y., Gebrekidan, B.A. et al. Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering. Acta Metall. Sin. (Engl. Lett.) 30, 688–696 (2017). https://doi.org/10.1007/s40195-017-0609-0

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  • DOI: https://doi.org/10.1007/s40195-017-0609-0

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