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Chemically deposited Co3S4 thin film: morphology dependant electrocatalytic oxygen evolution reaction

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Abstract

In the field of energy conversion and storage, the cost-effective and highly active oxygen evolution reaction (OER) catalysts are in much demand. Herein, morphology dependant OER activity of Co3S4 thin film electrodes fabricated using simple and cost effective successive ionic layer adsorption and reaction (SILAR) method is demonstrated for the first time. The morphology of Co3S4 has been influenced by varying number of deposition cycles. The effect of change in morphology on the electrocatalytic properties of Co3S4 thin film electrode is studied. The OER performance of Co3S4 thin film is related to the morphology. The OER activity with an overpotential of 275 mV @10 mA cm−2 and Tafel slope of 53 mV dec−1 in 1 M KOH electrolyte is due to increased electrochemical active surface area, super-hydrophilic nature, and low electron transfer resistance of Co3S4 thin film electrode.

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Acknowledgements

Authors are thankful to the Department of Science and Technology (DST), New Delhi, India for their financial support through research project no. DST/TMD/MES/2K17/04 dated 7 July 2018 and Human Resources Development Program (No. 20194030202470) of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) Grant funded by the Korean Government Ministry of Trade, Industry and Energy. Shital B. Kale acknowledges the Science & Engineering Research Board, a statutory body of the Department of Science and Technology (DST), Government of India for awarding the Overseas Visiting Doctoral Fellowship (Award No. ODF/2018/000132).

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Authors and Affiliations

  1. Centre for Interdisciplinary Research, D. Y. Patil Education Society (Institution Deemed to Be University), Kolhapur, MS, 416 006, India

    Shital B. Kale, Supriya J. Marje, Umakant M. Patil & Chandrakant D. Lokhande

  2. Department of Materials Science and Engineering, Optoelectronic Convergence Research Center, Chonnam National University, Gwangju, 500-757, South Korea

    Shital B. Kale & Jin Hyeok Kim

  3. Department of Electronics and Computer Engineering, Chonnam National University, Gwangju, 500-757, South Korea

    Vaibhav C. Lokhande

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  1. Shital B. Kale
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Correspondence to Jin Hyeok Kim or Chandrakant D. Lokhande.

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Kale, S.B., Lokhande, V.C., Marje, S.J. et al. Chemically deposited Co3S4 thin film: morphology dependant electrocatalytic oxygen evolution reaction. Appl. Phys. A 126, 206 (2020). https://doi.org/10.1007/s00339-020-3360-8

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